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lpplib-45482016-08-08 00:00:00Perpustakaan LPP YogyakartaCHIMICAL PROCESS PRINCIPLESOlaf A. Hougen, Kenneth M. Waston and Roland A. Ragatz.New York1954TEXT504 p; 22 cm;660.04 Hou c |
institution |
Politeknik LPP Yogyakarta |
collection |
Perpustakaan Yogyakarta |
description |
|
format |
TEXT |
author |
Olaf A. Hougen, Kenneth M. Waston and Roland A. Ragatz. |
spellingShingle |
Olaf A. Hougen, Kenneth M. Waston and Roland A. Ragatz. CHIMICAL PROCESS PRINCIPLES |
author_facet |
Olaf A. Hougen, Kenneth M. Waston and Roland A. Ragatz. |
author_sort |
Olaf A. Hougen, Kenneth M. Waston and Roland A. Ragatz. |
title |
CHIMICAL PROCESS PRINCIPLES |
title_short |
CHIMICAL PROCESS PRINCIPLES |
title_full |
CHIMICAL PROCESS PRINCIPLES |
title_fullStr |
CHIMICAL PROCESS PRINCIPLES |
title_full_unstemmed |
CHIMICAL PROCESS PRINCIPLES |
title_sort |
chimical process principles |
physical |
504 p; 22 cm; |
publisher |
New York |
publishDate |
1954 |
callnumber-raw |
660.04 Hou c |
callnumber-search |
660.04 Hou c |
_version_ |
1742524094032642048 |