CHIMICAL PROCESS PRINCIPLES

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Bibliographic Details
Main Author: Olaf A. Hougen, Kenneth M. Waston and Roland A. Ragatz.
Format: TEXT
Published: New York 1954
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id lpplib-4548
record_format oai_dc
spelling lpplib-45482016-08-08 00:00:00Perpustakaan LPP YogyakartaCHIMICAL PROCESS PRINCIPLESOlaf A. Hougen, Kenneth M. Waston and Roland A. Ragatz.New York1954TEXT504 p; 22 cm;660.04 Hou c
institution Politeknik LPP Yogyakarta
collection Perpustakaan Yogyakarta
description
format TEXT
author Olaf A. Hougen, Kenneth M. Waston and Roland A. Ragatz.
spellingShingle Olaf A. Hougen, Kenneth M. Waston and Roland A. Ragatz.
CHIMICAL PROCESS PRINCIPLES
author_facet Olaf A. Hougen, Kenneth M. Waston and Roland A. Ragatz.
author_sort Olaf A. Hougen, Kenneth M. Waston and Roland A. Ragatz.
title CHIMICAL PROCESS PRINCIPLES
title_short CHIMICAL PROCESS PRINCIPLES
title_full CHIMICAL PROCESS PRINCIPLES
title_fullStr CHIMICAL PROCESS PRINCIPLES
title_full_unstemmed CHIMICAL PROCESS PRINCIPLES
title_sort chimical process principles
physical 504 p; 22 cm;
publisher New York
publishDate 1954
callnumber-raw 660.04 Hou c
callnumber-search 660.04 Hou c
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